Thin films structural parameters research by analytical methods

Juravleva P.L., Schur P.A., Melnikov A.A.
UDC
66.017
DOI
10.18577/2307-6046-2019-0-6-104-113
Article PDF (Russian) (1012.65 KB)
How to cite
Juravleva P.L., Schur P.A., Melnikov A.A. Thin films structural parameters research by analytical methods // Proceedings of VIAM. 2019. No. 6. DOI: 10.18577/2307-6046-2019-0-6-104-113. URL: https://test.viam.ru/en/journal/2019/6/11
Keywords
x-ray reflectometry, atomic force microscopy, thin films, magnetron reactive deposition, thickness, density, roughness.
Abstract

Opportunities, features and restrictions of atomic force microscopy and X-ray reflectometry methods for thin-film systems on firm substrates (silicate glass, Si) and polymeric materials key structural parameters determination are described. Possible approaches to model and experimental data deviation minimization are shown in case of films parameters (density, thicknes, surfaces and interfaces roughness) measurement by x-ray reflectometry. Research results of thin films Ag, Al and Ti obtained by magnetron reactive deposition of metal targets are shown.

Reference list
  1. Kablov E.N. Innovacionnye razrabotki FGUP «VIAM» GNC RF po realizacii «Strategicheskih napravlenij razvitiya materialov i tehnologij ih pererabotki na period do 2030 goda» [Innovative developments of FSUE «VIAM» SSC of RF on realization of «Strategic directions of the development of materials and technologies of their processing for the period until 2030»] // Aviacionnye materialy i tehnologii. 2015. №1 (34). S. 3–33. DOI: 10.18577/2071-9140-2015-0-1-3-33.
  2. Kablov E.N. Iz chego sdelat budushcheye? Materialy novogo pokoleniya, tekhnologii ikh sozdaniya i pererabotki – osnova innovatsiy [What to make the future from? Materials of the new generation, technologies of their creation and processing are the basis of innovation] // Krylya Rodiny. 2016. №5. S. 8–18.
  3. Kablov E.N. Tendentsii i oriyentiry innovatsionnogo razvitiya Rossii: sb. nauchno-informatsionnykh materialov. 3-e izd. [Trends and benchmarks of innovative development of Russia: collection of scientific information materials]. M.: VIAM, 2015. 720 s.
  4. Kablov E.N., Solovyanchik L.V., Kondrashov S.V., Buznik V.M., Yurkov G.Y., Kushch P.P., Kichigina G.A., Kiryukhin D.P., Dyachkova T.P. Electroconductive hydrophobic polymer composite materials based on oxidized carbon nanotubes modified with tetrafluoroethylene telomers // Nanotechnologies in Russia. 2016. Vol. 11. No. 11–12. P. 782–790.
  5. Bogatov V.A., Kondrashov S.V., Hohlov Yu.A. Poluchenie gradientnogo pokrytiya oksinit-rida alyuminija metodom reaktivnogo magnetronnogo raspyleniya [Receiving gradient covering oxi-nitride aluminum method of reactive magnetron sputtering] // Aviacionnye materialy i tehnologii. 2010. №3. S. 19–21.
  6. Khokhlov Yu.A., Berezin N.M., Bogatov V.A., Krynin A.G., Popkov O.V. Kontrol reaktivnogo osazhdeniya ITO pokrytiya po emissionnomu spektru plazmy magnetronnogo razryada [Control of reactive deposition of ITO coating on the emission spectrum of the plasma magnetron discharge] // Aviacionnye materialy i tehnologii. 2015. №4 (37). S. 67–71. DOI: 10.18577/2071-9140-2015-0-4-67-71.
  7. Dermel I.V., Shashkeev K.A. Osobennosti magnetronnogo raspyleniya metallov v prisutstvii reaktivnykh gazov [Peculiarities of magnetron sputtering of metals in the presence of reactive gases] // Trudy VIAM: elektron. nauch.-tekhnich. zhurn. 2017. №11 (59). St. 11. Available at: http://www.viam-works.ru (accessed: February 11, 2019). DOI: 10.18577/2307-6046-2017-0-11-11-11.
  8. Khokhlov Yu.A., Berezin N.M., Bogatov V.A., Krynin A.G. Reaktivnoe magnetronnoe osazhdenie oksida indiya, legirovannogo olovom, s kontrolem rabochego davleniya [Reactive magnetron deposition of indium oxide alloyed with tin with the use of operating pressure control] // Aviacionnye materialy i tehnologii. 2015. №3. S. 60–63. DOI: 10.18577/2071-9140-2015-0-3-60-63.
  9. Bogatov V.A., Krynin A.G., Shchur P.A. Vliyaniye velichiny natekaniya v vakuumnoy kamere na parametry reaktivnogo magnetronnogo raspyleniya i svoystva pokrytiya oksida titana [Influence of the leakage value in the vacuum chamber on the parameters of reactive magnetron discharge and properties of titanium oxide coatings] // Aviaсionnye materialy i tehnologii. 2019. №1 (54). S. 17–22. DOI: 10.18577/2071-9140-2019-0-1-17-22.
  10. Fewster P.F. X-ray analysis of thin films and multilayers // Reports on Progress Physics. 1996. Vol. 59. No. 11. P. 1339–1407. DOI: 10.1088/0034-4885/59/11/001.
  11. Shcherbina M.A., Chvalun S.N., Ponomarenko S.A., Kovalchuk M.V. Sovremennyye podkhody k issledovaniyu tonkikh plenok i monosloyev: rentgenovskaya reflektometriya, rasseyaniye v skolzyashchikh uglakh otrazheniya i metod stoyachikh rentgenovskikh voln [Modern approaches to the study of thin films and monolayers: X-ray reflectometry, scattering in sliding reflection angles and the method of standing X-ray waves] // Uspekhi khimii. 2014. T. 83. №12. S. 1091–1119.
  12. Stoev K., Sakurai K. Recent theoretical models in grazing incidence x-ray reflectometry // The Rigaku Journal. 1997. Vol. 14. No. 2. P. 22–37.
  13. Chizhov P., Levin E., Mityayev A., Timofeyev A. Pribory i metody rentgenovskoy difraktsii [Devices and methods of x-ray diffraction]. Mozhaysk: Mozhayskiy poligraficheskiy kombinat, 2011. 151 s.
  14. Bouen D.K., Tanner B.K. Vysokorazreshayushchaya rentgenovskaya difraktometriya i topografiya [High resolution X-ray diffractometry and topography]. SPb.: Nauka, 2002. 256 s.
  15. Parratt L.G. Surface studies of solids by total reflection of X-rays // Physical Review. 1954. Vol. 95. P. 359–369.
  16. Fewster P.F. X-Ray Scattering from Semiconductors. London: Imperial College Press, 2003. 299 p.
  17. Belyayeva A.O., Sidorova S.V., Mironov YU.M., Panfilov Yu.V. Formirovaniye nanorazmernykh plenok titana na kremnii [Formation of nanoscale films of titanium on silicon] // Vestnik MGTU im. N.E. Baumana. Ser. Priborostroyeniye. 2010. Spetsvypusk. S. 169–177.
  18. Protopopov V.V., Valiev K.A., Imamov R.M. Comparative study of rough substrates for x-ray mirrors by the methods of x-ray reflectivity and scanning probe microscopy // Crystallography Reports. 1997. Vol. 42. P. 686–694.
  19. Vostokov N.V., Gaponov S.V., Mironov V.L. i dr. Opredeleniye effektivnoy sherokhovatosti podlozhek iz stekla v rentgenovskom diapazone dlin voln po dannym atomno-silovoy mikroskopii [Determination of the effective roughness of glass substrates in the X-ray wavelength range according to atomic force microscopy data] // Poverkhnost. 2001. T. 1. S. 38–42.