Analytical control of the chemical composition of galvanic electrolytes of nickel plating by the ICP AES and ICP MS methods

Dvoretskov R.M., Karachevtsev F.N., Dyomin S.A.
UDC
006.9; 543.6; 669.245
DOI
10.18577/2307-6046-2023-0-3-117-131
Article PDF (Russian) (838.29 KB)
How to cite
Dvoretskov R.M., Karachevtsev F.N., Dyomin S.A. Analytical control of the chemical composition of galvanic electrolytes of nickel plating by the ICP AES and ICP MS methods // Proceedings of VIAM. 2023. No. 3. DOI: 10.18577/2307-6046-2023-0-3-117-131. URL: https://test.viam.ru/en/journal/2023/3/11
Keywords
analytical control, galvanic nickel plating, nickel sulfate, nickel chloride, electrolytes, inductively coupled plasma atomic emission spectrometry (ICP AES), inductively coupled plasma mass-spectrometry (ICP MS)
Abstract

This work is devoted to the issues of determining the chemical composition of galvanic nickel plating electrolytes using the methods of atomic emission spectrometry and inductively coupled plasma mass spectrometry. The mass fraction of components in model electrolyte solutions at different dilutions was determined. The metrological characteristics of the obtained results were evaluated. Concentration ranges were chosen to which it is optimal to dilute stock solutions in order to obtain reproducible and reliable results.

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