Investigation of an impact of a negative electric potential of the substrate on deposition rate of multicomponent nickel coatings on the surface of cast heat-resistant nickel alloys
An impact of a negative electrical potential (voltage) of the substrate on deposition rate of multicomponent Ni-based coatings produced by the cathodic arc physical vacuum deposition from the surface of cathodes made of nickel-based alloys with additives of chromium, aluminum, tantalum, rhenium, yttrium, hafnium on the surface of specimens of various cast heat-resistant nickel alloys was investigated. It was shown that the maximum etching rate could be achieved in case of applying of 350 V potential to a substrate. The threshold values of spray voltage for all compositions of heat-resistant materials tested in this study were determined. An influence of the chemical composition of the plasma formed in vacuum from the cathode surface on the sputtering threshold was stated depending on the content of chromium and high-melting point elements in the cathode.
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