Determination of impurities in nickel by ICP-MS

Alekseev A.V., Yakimovitch P.V., Kvachonok I.K.
UDC
543.51:669.245
DOI
10.18577/2307-6046-2020-0-2-101-108
Article PDF (Russian) (568.06 KB)
How to cite
Alekseev A.V., Yakimovitch P.V., Kvachonok I.K. Determination of impurities in nickel by ICP-MS // Proceedings of VIAM. 2020. No. 2. DOI: 10.18577/2307-6046-2020-0-2-101-108. URL: https://test.viam.ru/en/journal/2020/2/11
Keywords
inductively coupled plasma mass spectrometry (ICP-MS), nickel alloys, determination of harmful impurities, nickel analysis, microwave sample preparation.
Abstract

The content of impurities of 20 elements (P, Ti, V, Mn, Fe, Co, Cu, Zn, Ga, As, Se, Mo, Ag, Cd, Sn, Sb, Te, Tl, Pb, Bi) in nickel samples by inductively coupled plasma mass spectrometry (ICP-MS). The technique of sample dissolution and its preparation for analysis is given. Spectral interference was eliminated using the equations of mathematical correction, the use of a reaction-collision cell, and also by selecting the plasma power. The correctness of the results is confirmed by analysis of a certified standard sample of nickel alloy. The range of determined concentrations: 0,00002–0,0101% of the mass.

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