Mathematical modeling of the titanium deposition process at the MAP-3 ion-plasma deposition unit

Artemenko N.I., Simonov V.N.
UDC
001.891.573:669.295
DOI
10.18577/2307-6046-2017-0-6-3-3
Article PDF (Russian) (707.58 KB)
How to cite
Artemenko N.I., Simonov V.N. Mathematical modeling of the titanium deposition process at the MAP-3 ion-plasma deposition unit // Proceedings of VIAM. 2017. No. 6. DOI: 10.18577/2307-6046-2017-0-6-3-3. URL: https://test.viam.ru/en/journal/2017/6/3
Keywords
ion-plasma condensed coatings, microdroplet phase, substrate temperature during coating, specific weight change.
Abstract

A mathematical model of the deposition of a coating from a two-component ion-droplet plasma of a vacuum-arc discharge from an alloy VT1-0 (titanium) is considered. It is established that the temperature of the substrate during coating depends on arc current and bias voltage. A relation is obtained from which it follows that the relative amount of the microdroplet phase in the ion-plasma coating is insignificant, but monotonically increases with increasing arc current. It is established that the specific change in the mass of the sample during coating depends on the arc current, voltage and time of the process. Formulas are proposed for calculating the substrate temperature and the specific change in the sample mass for ion-plasma coating deposition from the VT1-0 alloy. The obtained results can be used in the development and planning of the coating process on the MAP-3 ion-plasma installation, as well as predicting some properties of the obtained ion-plasma condensed coatings. Work is

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