Analysis of silicon by glow discharge high-resolution mass spectrometry

Alekseev A.V., Yakimovitch P.V.
UDC
543.51:669.1
DOI
10.18577/2307-6046-2025-0-8-163-172
Article PDF (Russian) (645.68 KB)
How to cite
Alekseev A.V., Yakimovitch P.V. Analysis of silicon by glow discharge high-resolution mass spectrometry // Proceedings of VIAM. 2025. No. 8. DOI: 10.18577/2307-6046-2025-0-8-163-172. URL: https://test.viam.ru/en/journal/2025/8/14
Keywords
high resolution glow discharge mass spectrometry, silicon, nickel alloys, determination of harmful impurities
Abstract

In this work, we have determined the impurities of 43 elements in silicon by high-resolution glow discharge mass spectrometry. The sample preparation for analysis is described. The analysts have selected the corresponding equipment settings to achieve maximum analytical signals from all the elements being sought. Spectral interferences have been eliminated by using high resolution. Relative sensitivity coefficients have been calculated for all the elements being determined using X-ray fluorescence spectroscopy.

Reference list
  1. Shelpakova I.R., Shaverina A.V. Determination of impurity composition of silicon (review). Analitika i kontrol, 2011, vol. 15, no. 2, pp. 141–150.
  2. Evdokimov S.A., Shchegoleva N.E., Kachaev A.A. Methods for joining ceramic composite materials based on SiC with ceramic and metallic materials (review). Aviation materials and technologies, 2022, no. 3 (68), paper no. 07. Available at: http://www.journal.viam.ru (accessed: December 14, 2024). DOI: 10.18577/2713-0193-2022-0-3-75-83.
  3. Kvyatkovskaya A.S., Saburova Yu.B., Belonogov V.A. et al. The investigation of electrodeposited Ni‒SiC coatings and the methods of its application on aluminum alloys. Aviation materials and technologies, 2024, no. 4 (77), paper no. 09. Available at: http://www.journal.viam.ru (accessed: December 14, 2024). DOI: 10.18577/2713-0193-2024-0-4-128-139.
  4. Erasov V.S., Oreshko E.I. Fatigue tests of metal materials (review). Part 1. Main definitions, loading parameters, representation of results of tests. Aviacionnye materialy i tehnologii, 2020, no. 4 (61), pp. 59–70. DOI: 10.18577/2071-9140-2020-0-4-59-70.
  5. Kablov E.N., Kutyrev A.E., Vdovin A.I., Kozlov I.A., Afanasyev-Khodykin A.N. The research of possibility of galvanic corrosion in brazed connections used in aviation engine construction. Aviation materials and technologies, 2021, no. 4 (65), paper no. 01. Available at: http://www.journal.viam.ru (accessed: December 14, 2024). DOI: 10.18577/2713-0193-2021-0-4-3-13.
  6. Kablov E.N., Chabina E.B., Morozov G.A., Muravskaya N.P. Conformity assessment of new materials using high-level CRMs and MI. Kompetentnost, 2017, no. 2. pp. 40–46.
  7. State Standard 26239.3–84. Semiconductor silicon, source products for its production and quartz. Methods for determination of phosphorus. Moscow: Publ. house of standards, 1984, pp. 1–3.
  8. State Standard 19014.2–73. Crystalline silicon. Methods for determination of iron. Moscow: Publ. house of standards, 1973, pp. 1–3.
  9. State Standard 19014.3–73. Crystalline silicon. Methods for determination of calcium. Moscow: Publ. house of standards, 1973, pp. 1–3.
  10. Tsygankova A.R., Shaverina A.V., Shelpakova I.R., Saprykin A.I. Comparison of analytical capabilities of combined methods of analysis of high-purity substances with excitation of radiation in a direct current arc and inductively coupled plasma. Analitika i kontrol, 2012, vol. 16, no. 4, pp. 420–424.
  11. Hu J., Wang H. Determination of Trace Elements in Super Alloy by ICP-MS. Mikrochimica Acta, 2001, vol. 137, pp. 149–155.
  12. Pupyshev A.A., Epova E.N. Spectral interference of polyatomic ions in the method of mass spectrometry with inductively coupled plasma. Analitika i kontrol, 2001, vol. 5, no. 4, pp. 335–369.
  13. Dong X., Xiong Y., Wang N. et al. Determination of trace elements in high-purity quartz samples by ICP-OES and ICP-MS: A normal-pressure digestion pretreatment method for eliminating unfavorable substrate Si. Analytical Chimica Acta, 2020, vol. 1110, pp. 11–18. DOI: 10.1016/j.aca.2020.03.006.
  14. State Standard 26239.5–84. Semiconductor silicon and quartz. Method for determining impurities. Moscow: Publ. house of standards, 1984, pp. 1–3.
  15. Jakubowski N., Prohaska T., Rottmann L., Vanhaecke F. Inductively coupled plasma- and glow discharge plasma-sector field mass spectrometry. Part I. Tutorial: Fundamentals and instrumentation. Journal of Analytical Atomic Spectrometry, 2011, vol. 26, pp. 693–726.
  16. Ganeev A.A., Gubal A.R., Uskov K.N., Potapov S.V. Analytical mass spectrometry with glow discharge. Izvestiya Akademii nauk. Seriya khimicheskaya, 2012, no. 4, pp. 1–15.